Hybrid Silicon Optoelectronic Technologies

McLaughlin, Andrew J (1998) Hybrid Silicon Optoelectronic Technologies. PhD thesis, University of Glasgow.

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Abstract

The aim of this project was to realise integrated optical interferometers suitable for use in low-coherence optical sensor systems. The research focused on the development of waveguide fabrication techniques and the design of phase tuned interferometers. The flame hydrolysis deposition technique was employed to produce SiO2-GeO2-B2O3 glass films. The result was the production of high quality planar waveguide films with a controllable refractive index and thickness. A high degree of dopant homogeneity was observed between depositions, and across deposited glass films. Ridge waveguide fabrication was facilitated through the use of photolithography and reactive ion etching (RIE). Photolithography was used to define waveguide patterns in NiCr etch masks. A reproducible, high rate, high selectivity CHF3 reactive ion etch process was developed which reduced the typical RIE process time to approximately 1 hour for a 6 jam waveguide structure. The result of the processing was the fabrication of ridge waveguides with low sidewall roughness, and a sidewall angle >89

Item Type: Thesis (PhD)
Qualification Level: Doctoral
Additional Information: Adviser: Stewart Aitchison
Keywords: Electrical engineering
Date of Award: 1998
Depositing User: Enlighten Team
Unique ID: glathesis:1998-75951
Copyright: Copyright of this thesis is held by the author.
Date Deposited: 19 Nov 2019 17:13
Last Modified: 19 Nov 2019 17:13
URI: http://theses.gla.ac.uk/id/eprint/75951

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