Cunningham, William Reilly
(2003)
Plasma processes for novel detector fabrication.
PhD thesis, University of Glasgow.
Full text available as:
Abstract
Plasmas have a wide range of uses from fluorescent light tubes to high technology semiconductor fabrication. In this work I will attempt to discuss a number of plasma processes which have been developed for standard semiconductor fabrication over recent years and apply them to producing detectors in a novel fashion. This will encompass the alteration of older existing processes used on silicon (Si) for use with a new detector material, silicon carbide (SiC). The other application which will be investigated is the use of processes to fabricate devices in indium tin oxide (ITO) which is a transparent conductive semiconductor used in making screens for laptop computers for a new application. ITO will used to produce a range of microelectrode arrays which can be used in neurophysiology studies using retinal tissue.
Item Type: |
Thesis
(PhD)
|
Qualification Level: |
Doctoral |
Additional Information: |
Adviser: Mahfuzur Rahman |
Keywords: |
Electrical engineering, Plasma physics, Condensed matter physics |
Date of Award: |
2003 |
Depositing User: |
Enlighten Team
|
Unique ID: |
glathesis:2003-74061 |
Copyright: |
Copyright of this thesis is held by the author. |
Date Deposited: |
23 Sep 2019 15:33 |
Last Modified: |
23 Sep 2019 15:33 |
URI: |
http://theses.gla.ac.uk/id/eprint/74061 |
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