Plasma processes for novel detector fabrication

Cunningham, William Reilly (2003) Plasma processes for novel detector fabrication. PhD thesis, University of Glasgow.

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Plasmas have a wide range of uses from fluorescent light tubes to high technology semiconductor fabrication. In this work I will attempt to discuss a number of plasma processes which have been developed for standard semiconductor fabrication over recent years and apply them to producing detectors in a novel fashion. This will encompass the alteration of older existing processes used on silicon (Si) for use with a new detector material, silicon carbide (SiC). The other application which will be investigated is the use of processes to fabricate devices in indium tin oxide (ITO) which is a transparent conductive semiconductor used in making screens for laptop computers for a new application. ITO will used to produce a range of microelectrode arrays which can be used in neurophysiology studies using retinal tissue.

Item Type: Thesis (PhD)
Qualification Level: Doctoral
Additional Information: Adviser: Mahfuzur Rahman
Keywords: Electrical engineering, Plasma physics, Condensed matter physics
Date of Award: 2003
Depositing User: Enlighten Team
Unique ID: glathesis:2003-74061
Copyright: Copyright of this thesis is held by the author.
Date Deposited: 23 Sep 2019 15:33
Last Modified: 23 Sep 2019 15:33

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