Glasgow Theses Service

Gate leakage variability in nano-CMOS transistors

Markov, Stanislav Nikolaev (2009) Gate leakage variability in nano-CMOS transistors. PhD thesis, University of Glasgow.

Full text available as:
[img]
Preview
PDF
Download (5MB) | Preview

Abstract

Gate leakage variability in nano-scale CMOS devices is investigated through advanced modelling and simulations of planar, bulk-type MOSFETs. The motivation for the work stems from the two of the most challenging issues in front of the semiconductor industry - excessive leakage power, and device variability - both being brought about with the aggressive downscaling of device dimensions to the nanometer scale. The aim is to deliver a comprehensive tool for the assessment of gate leakage variability in realistic nano-scale CMOS transistors. We adopt a 3D drift-diffusion device simulation approach with density-gradient quantum corrections, as the most established framework for the study of device variability. The simulator is first extended to model the direct tunnelling of electrons through the gate dielectric, by means of an improved WKB approximation. A study of a 25 nm square gate n-type MOSFET demonstrates that combined effect of discrete random dopants and oxide thickness variation lead to starndard deviation of up to 50% (10%) of the mean gate leakage current in OFF(ON)-state of the transistor. There is also a 5 to 6 times increase of the magnitude of the gate current, compared to that simulated of a uniform device. A significant part of the research is dedicated to the analysis of the non-abrupt bandgap and permittivity transition at the Si/SiO2 interface. One dimensional simulation of a MOS inversion layer with a 1nm SiO2 insulator and realistic band-gap transition reveals a strong impact on subband quantisation (over 50mV reduction in the delta-valley splitting and over 20% redistribution of carriers from the delta-2 to the delta-4 valleys), and enhancement of capacitance (over 10%) and leakage (about 10 times), relative to simulations with an abrupt band-edge transition at the interface.

Item Type: Thesis (PhD)
Qualification Level: Doctoral
Keywords: nanotechnology, nano-CMOS, device variabiliy, gate leakage, gate tunnelling current, MOSFET, gate leakage variability, gate leakage fluctuations, transitional oxide, silicon dioxide
Subjects: Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Colleges/Schools: College of Science and Engineering > School of Engineering
Supervisor's Name: Asenov, Prof. Asen
Date of Award: 2009
Depositing User: Dr Stanislav Markov
Unique ID: glathesis:2009-771
Copyright: Copyright of this thesis is held by the author.
Date Deposited: 15 May 2009
Last Modified: 10 Dec 2012 13:26
URI: http://theses.gla.ac.uk/id/eprint/771

Actions (login required)

View Item View Item